CNRS Technologies

Find the best CNRS technologies to boost your innovative project.

Les brevets les plus récents

You are a research scientist?

We can guide you through the whole technology transfer process.

See all our services

You are a corporate player?

Thanks to our expertise, our network and our know-how of the innovation ecosystem, we support you throughout your project.

Contact us

Follow our news and upcoming events

Discover CNRS technologies

Meet our team

Fermer

Cleaning device and cleaning process

Référence

00790-01

Statut des brevets

Frenche patent application FR0605238 filed on June 13th, 2006

Inventeurs

Jacques PELLETIER
Ana LACOSTE
Stephane BECHU
Alexandre BES
Jérôme SIROU

Statut commercial

Exclusive or non-exclusive licence Collaborative research

Laboratoire

LPSC, CNRS http://lpsc.in2p3.fr

Description

TECHNICAL DESCRIPTION

The invention concerns a cleaning process utilizing a dry chemical means assisted by plasma from a reactor (10) containing an unwanted deposit on its walls and at least one other polarizable surface (12), characterized in that it comprises a plurality of alternative suites of:

– A sequence (“negative”) of cleaning of the at least one other polarizable surface by negatively polarization of the surface regarding to the reactor walls (maintained at a reference potential)

– A sequence (“positive”) of cleaning the reactor walls by positively polarization of the surface regarding to the reactor walls maintained at a reference potential

BENEFITS

  • – cleaning operation by conventional etching process with controlled polarization
    – no modification of the reactor architecture
    – no sputtering of the inner chamber surfaces
    – smart process (no degradation of the reactor, enhanced rate versus post-discharge
    – no additional plasma source

INDUSTRIAL APPLICATIONS

Cleaning the walls of the plasma reactor from unwanted deposit in plasma process as CVD, PVD, sputtering…

Example of removed deposit :

  • – DLC in O2 plasmas
    – W, Mo, Si or SiO2 in NF3 plasmas
    – SiOCH in NF3 / O2 gas mixtures

 


Besoin de plus d'informations ?

Nous contacter
Fermer

Contactez-nous

  • This field is for validation purposes and should be left unchanged.
Fermer

Les brevets les plus récents