CNRS Technologies

Find the best CNRS technologies to boost your innovative project.

Newest patents

You are a research scientist?

We can guide you through the whole technology transfer process.

See all our services

You are a corporate player?

Thanks to our expertise, our network and our know-how of the innovation ecosystem, we support you throughout your project.

Contact us

Follow our news and upcoming events

Discover CNRS technologies

Meet our team

Close

Electroless polyphosphabenzene-based III-V semiconductors passivation process

Reference

03024-01

Patents status

French patent application FR1155157 filed on June the 1st, 2011 and entitled « Procédé de passivation chimique d’une surface d’un produit de matériau semi-conducteur iii-v, et produit obtenu par un tel procédé »

Inventors

Arnaud ETCHEBERRY
Anne-Marie CONCALVES
Charles MATHIEU
Pascal LEFLOCH (†)
Nicolas MEZAILLES
Jackie VIGNERON

commercial status

Exclusive or non-exclusive licenses

Laboratory

Institut Lavoisier (ILV, UMR8180), Versailles, France.
Hétéroélements et Coordination (LHC, UMR 7653), Palaiseau, France.

Description

CONTEXT

Semiconductor surface treatment aiming at passivating and inhibiting corrosion are highly innovative. The ‘Institut Lavoisier’ from whom the present technology is originated from had already worked on this subject and developped a passivation process with electrochemical assistance. Nevertheless, the present technolgy goes further and aims at avoiding complex process required by the electrochemical process.

TECHNICAL DESCRIPTION

In the present work, the inventors have developped an electroless process of depositing a polyphosphazen [H2N-P=N-]n layer on the surface of III-V semiconductor and more specifically III-P (Phophorus) and InP (Indium-Phosphide) acting therefore as a passivation layer. The process is electroless and simply consists at using an oxydant chemicals (for example PCl5) in an amonia-based solvent.

DEVELOPMENT STAGE

The process has been fully tested, reproduced and assessed.

BENEFITS

This process offers numerous advantages:

  • Electroless;
  • Inexpensive and eco-friendly solvent;
  • Compatible with current semiconductors manufacturing’s processes;
  • Compatible with photomask materials;
  • Highly reproductible;
  • Robustness.

 

INDUSTRIAL APPLICATIONS

The primary application of the present process is to provide an electroless way to passivate III-V semiconductor inhibiting therefore any corrosion.

For further information, please contact us (Ref 03024-01)

 


Need further information ?

Contact us
Close

Contact us

  • This field is for validation purposes and should be left unchanged.
Close

Newest patents